Nearfield Instruments

• Develop and optimize optical imaging models and techniques for use in advanced metrology and inspection. • Translate scanner performance knowledge (CDU, focus, overlay, aberrations, imaging limits) into innovative process control solutions. • Apply expertise in (High-NA) EUV mask characterization, including 3D feature metrology (absorber CD, sidewall angle, height) and resist behavior under EUV and out-of-band light exposure. • Advance methods such as scatterometry and computational imaging to push the limits of in-line process control. • Collaborate with system architects, AFM/imaging experts, and software engineers to integrate imaging innovations into our commercial systems. • Work with leading global semiconductor fabs to validate and deploy solutions in high-volume manufacturing environments.